Deposition uniformity inspection in IC wafer surface
نویسندگان
چکیده
منابع مشابه
Deposition uniformity inspection in IC wafer surface
This paper focuses on the task of automatic visual inspection of color uniformity on the surface of integrated circuits (IC) wafers arising from the layering process. The oxide thickness uniformity within a given wafer with a desired target thickness is of great importance for modern semiconductor circuits with small oxide thickness. The non-uniform chemical vapor deposition (CVD) on a wafer su...
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ژورنال
عنوان ژورنال: Journal of Physics: Conference Series
سال: 2014
ISSN: 1742-6596
DOI: 10.1088/1742-6596/483/1/012022